Such a transfer, if confirmed, would represent a direct breach of a long-standing, U.S.-led export ban that has prohibited the sale of EUV systems to China since at least 2019 .

ASML's Denial

ASML has denied the allegation in the strongest terms. A company spokesperson stated unequivocally that ASML has "never shipped an EUV machine to China" . The company also provided documentation to U.S. officials in an effort to clear itself, arguing that the machines are the size of a school bus, produced in very limited quantities, require constant on-site maintenance by ASML staff, and are already subject to strict export controls that explicitly prohibit their sale to China . ASML stated it "regularly engages in transparent and open dialogue with government leaders around the world" and that it understands and complies with both U.S. and Dutch export control regulations .

The Evidence Cited by U.S. Officials

The specific evidence that prompted Lutnick's intervention has not been publicly detailed. Bloomberg News, which broke the story, cited "people familiar with the matter" but did not describe the intelligence, shipping records, or other proof that triggered the concern . There are no public reports of a confirmed sighting of an EUV system in China, no intercepted shipments, and no service logs showing unauthorized installation.

The broader context, however, provides a backdrop for the suspicion. In December 2025, Reuters reported that Chinese researchers in Shenzhen had built a prototype of an EUV lithography machine as part of a state-backed effort insiders have dubbed China's "Manhattan Project" to rival the West in AI chips . Separately, the Center for a New American Security noted that some dual-use or less-restricted components that could aid domestic EUV development have been harder to track . Whether these developments are linked to the current allegation remains unconfirmed.

Some Trump administration officials have told Bloomberg that they possess evidence ASML shipped specialized equipment used to transport EUV machines, as well as components usable in EUV systems, to China—but they refused to let reporters examine the export records or to confirm that China actually has a fully operational EUV system, citing the information's sensitivity .

Broader Context of Export Restrictions and the MATCH Act

The EUV allegation lands in a much larger policy battle. Here is where the export control system stands:

• Existing EUV ban: U.S.-led export controls already prohibit ASML from shipping EUV systems to China. If true, this alleged breach would cut to the heart of that ban .
• DUV controls (current): Less advanced deep ultraviolet (DUV) immersion lithography machines, which can produce chips down to 7nm nodes, have continued to flow to China and are the next major target of restrictions .
• The MATCH Act (H.R. 8170): On April 2, 2026, a bipartisan group of U.S. lawmakers introduced the Multilateral Alignment of Technology Controls on Hardware (MATCH) Act . Key provisions include:

In short, the MATCH Act seeks to codify and broaden current executive-branch export controls into statute, closing the DUV loophole and pressuring allies to follow suit. The new EUV allegation underscores that even the strictest existing bans may face serious enforcement challenges.

Bottom line: As of June 19, 2026, the U.S. has raised an explosive allegation with no public proof, ASML maintains a firm denial, and Congress is moving to close the last remaining legal pathway for China to acquire advanced chipmaking tools—all while questions about the physical security of existing export controls remain unanswered.

Such a transfer, if confirmed, would represent a direct breach of a long-standing, U.S.-led export ban that has prohibited the sale of EUV systems to China since at least 2019 .

ASML's Denial

ASML has denied the allegation in the strongest terms. A company spokesperson stated unequivocally that ASML has "never shipped an EUV machine to China" . The company also provided documentation to U.S. officials in an effort to clear itself, arguing that the machines are the size of a school bus, produced in very limited quantities, require constant on-site maintenance by ASML staff, and are already subject to strict export controls that explicitly prohibit their sale to China . ASML stated it "regularly engages in transparent and open dialogue with government leaders around the world" and that it understands and complies with both U.S. and Dutch export control regulations .

The Evidence Cited by U.S. Officials

The specific evidence that prompted Lutnick's intervention has not been publicly detailed. Bloomberg News, which broke the story, cited "people familiar with the matter" but did not describe the intelligence, shipping records, or other proof that triggered the concern . There are no public reports of a confirmed sighting of an EUV system in China, no intercepted shipments, and no service logs showing unauthorized installation.

The broader context, however, provides a backdrop for the suspicion. In December 2025, Reuters reported that Chinese researchers in Shenzhen had built a prototype of an EUV lithography machine as part of a state-backed effort insiders have dubbed China's "Manhattan Project" to rival the West in AI chips . Separately, the Center for a New American Security noted that some dual-use or less-restricted components that could aid domestic EUV development have been harder to track . Whether these developments are linked to the current allegation remains unconfirmed.

Some Trump administration officials have told Bloomberg that they possess evidence ASML shipped specialized equipment used to transport EUV machines, as well as components usable in EUV systems, to China—but they refused to let reporters examine the export records or to confirm that China actually has a fully operational EUV system, citing the information's sensitivity .

Broader Context of Export Restrictions and the MATCH Act

The EUV allegation lands in a much larger policy battle. Here is where the export control system stands:

• Existing EUV ban: U.S.-led export controls already prohibit ASML from shipping EUV systems to China. If true, this alleged breach would cut to the heart of that ban .
• DUV controls (current): Less advanced deep ultraviolet (DUV) immersion lithography machines, which can produce chips down to 7nm nodes, have continued to flow to China and are the next major target of restrictions .
• The MATCH Act (H.R. 8170): On April 2, 2026, a bipartisan group of U.S. lawmakers introduced the Multilateral Alignment of Technology Controls on Hardware (MATCH) Act . Key provisions include:

In short, the MATCH Act seeks to codify and broaden current executive-branch export controls into statute, closing the DUV loophole and pressuring allies to follow suit. The new EUV allegation underscores that even the strictest existing bans may face serious enforcement challenges.

Bottom line: As of June 19, 2026, the U.S. has raised an explosive allegation with no public proof, ASML maintains a firm denial, and Congress is moving to close the last remaining legal pathway for China to acquire advanced chipmaking tools—all while questions about the physical security of existing export controls remain unanswered.

• A country-wide prohibition on the sale of "chokepoint" semiconductor manufacturing equipment—including DUV immersion lithography tools and cryogenic etch tools—to any destination inside a country of concern (naming China directly) .
• A requirement that allied nations like the Netherlands and Japan align their export restrictions with U.S. rules within 150 days, or face unilateral U.S. enforcement via an expanded Foreign Direct Product Rule that would give Washington jurisdiction over any equipment containing American technology .
• A prohibition on servicing already-installed DUV machines in China .
• The bill passed the House Foreign Affairs Committee in late April 2026 and advanced as part of a broader markup of export control measures .
• Some provisions were scaled back before the committee vote (e.g., a country-wide ban on cryogenic etching tools was dropped), but the DUV restrictions held firm .

• A country-wide prohibition on the sale of "chokepoint" semiconductor manufacturing equipment—including DUV immersion lithography tools and cryogenic etch tools—to any destination inside a country of concern (naming China directly) .
• A requirement that allied nations like the Netherlands and Japan align their export restrictions with U.S. rules within 150 days, or face unilateral U.S. enforcement via an expanded Foreign Direct Product Rule that would give Washington jurisdiction over any equipment containing American technology .
• A prohibition on servicing already-installed DUV machines in China .
• The bill passed the House Foreign Affairs Committee in late April 2026 and advanced as part of a broader markup of export control measures .
• Some provisions were scaled back before the committee vote (e.g., a country-wide ban on cryogenic etching tools was dropped), but the DUV restrictions held firm .